Diffusion in Ceramics

Über den Autor

Joshua Pelleg received his B.S. in Chemical Engineering Technion Institute of Technology, Haifa, Israel, M. S. in Metallurgy, Illinois Institute of Technology, Chicago, IL, USA and Ph. D. in Metallurgy, University of Wisconsin, Madison, WI. He is with Ben Gurion University of the Negev, Materials Engineering Department, Beer Sheva, Israel since 1970, was among the founders of the department, and its second chairman. Professor Pelleg was the recipient of the Sam Ayrton Chair in Metallurgy. He has taught ever since the subjects of Mechanical Properties of Materials, Diffusion in Solids and Defects in Solids. He has chaired several University committees and served four terms as the Chairman of Advanced Studies in Ben Gurion University. Prior to arriving to BGU, Pelleg acted as Assistant Professor and then Associate Professor in the Department of Materials and Metallurgy, University of Kansas, Lawrence, KS, USA. Professor Pelleg was Visiting Professor in: Department of Metallurgy, Iowa State University, Institute for Atomic Research, US Atomic Energy Commission, Ames, IA, USA, McGill University, Montreal, QC, Canada, Tokyo Institute of Technology, Applied Electronics Dept., Nagatsuta Campus, Yokohama, Japan and in Curtin University, Department of Physics, Perth, Australia. Among his non-academic research and industrial experience one can note: Chief Metallurgist in Urdan Netallurgical Works LTD., Netanya, Israel, Research Engineer in International Harvester, Manufacturing Research, Chicago IL., Associate Research Officer, National Research Council of Canada, Structures and Materials, National Aeronautical Establishment, Ottawa, ON, Physics Senior Research Scientist, Nuclear Research Center, Beer Sheva, Israel. Materials Science Division, Argonne National Labs, Argonne, IL, USA., Atomic Energy of Canada, Chalk River, Ont. Canada, Visiting Scientist, CSIR, National Accelerator Centre, Van de Graaf Group Faure, South Africa, Bell Laboratories, Murray Hill, NJ, USA, GTE Laboratories, Waltham, MA, USA. His current research interests are diffusion in solids, thin film deposition and properties (mostly by sputtering) and characterization of thin films among them various silicides.